If you are sputtering, please review our power supply selection matrix:
Our power products deliver:
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Unrivaled power plasma control
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Unmatched DC and RF arc handling
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Cutting-edge match technology
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Leading, integrated, and field-proven power-delivery solutions
We've designed our power system capabilities for:
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RF cleaning
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Metal and dielectric etching
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Photoresist ashing
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Chemical vapor deposition (CVD)
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Plasma-enhanced chemical vapor deposition (PECVD)
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Physical vapor deposition (PVD)
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Sputter deposition
In addition, we supply DC sputtering (reactive and metallic), AC dual-cathode sputtering, and PECVD as well as units for ion beam deposition, reactive ion beam etch (RIBE), and leading-edge plasma instrumentation applications.