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Power Delivery Systems

Advanced Energy’s field-proven Precision Power™ solutions offer best-in-class control and stability across a wide range of plasma power applications. Our comprehensive power delivery technologies have enabled process innovation for more than 40 years and continue to push the boundary forward with our partners.

Power Delivery Systems

eVoS LE Bias Solution

  • Ability to produce near mono-energetic ion energy distributions
  • Pulse capability with necessary input and output signals for synchronization
  • Integrated design and compact size eliminates need for matching network

eVoS ME Bias Solution

  • Customized ion energy distribution maximizes concentration to process-optimal levels.
  • Independently regulated voltage and current output enhances control of bias conditions.
  • Proprietary control system enables direct manipulation of wafer bias characteristics.
  • Fast, digitized metrology provides real-time output monitoring and control.

Paramount HFi RF Power Delivery System

  • High reliability and reproducibility
  • Reduced footprint
  • Fast tuning and direct power regulation

Featured Products

Featured

eVoS LE Bias Solution

Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy

Datasheet

Featured

eVoS ME Bias Solution

The eVoS™ platform enables direct control of wafer-surface voltage and ion energy distribution, empowering process engineers to optimize bias performance for specific process results.

Datasheet

Featured

eVerest RF Generator

Angstrom Era Precision Power

Datasheet

Featured

Navigator II Match Network

Rapid, Accurate, and Reliable Digitally-Tuned Matching

Datasheet

Technical Documentation

Title Type
eVoS™ Family Brochure (18 MB) Brochure
eVoS™ Family Brochure (18 MB) Brochure
eVoS™ 非対称バイアス波形ジェネレータ (18 MB) Brochure
RF Calibration Solutions (530 KB) Brochure
eVos LE Data Sheet (3 MB) Data Sheet
eVoS ME Data Sheet (233 KB) Data Sheet
eVoS™ Datasheet (3 MB) Data Sheet
Forward and Reflected Power: What Does It Mean? (576 KB) White Paper

Related Applications

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Semiconductor

AE provides precision plasma power delivery with sophisticated, high-speed controls for next-generation process innovation.
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Etch

Advanced Energy's high-precision plasma power delivery systems provide exacting control of etch applications for high repeatability and yield.
Explore Etch

Deposition

AE offers a comprehensive portfolio for semiconductor deposition, including plasma power delivery, temperature measurement, temperature control, and wafer control solutions.
Explore Deposition

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