The Litmas^® RPS is the only fully integrated, remote, inductive plasma source and power-delivery system available in a high-conductance, low-surface-area geometry. It is well suited to deliver reactive gas species to processes such as wafer pre-clean, photoresist strip, and atomic layer deposition (ALD). In addition, its high power density and high conductance make it the ideal platform for post-process exhaust gas abatement.

The Litmas RPS delivers up to 3 kW of stable radio-frequency (RF) power in less than 3 msec, enabling faster changing, sub-90 nm and 300-mm processes.

Benefits	Features
Reduced charge damage to fragile device structures High reactive specie flux generation Broad range of process chemistries Fast-matching, stable power delivery Reduced CoO Enhanced end-user process development and yields	Integrated power supply, match, and plasma chamber Patented LitmasMatch™ solid-state power-delivery topology Plug-and-play installation Uniquely wide matching range Durable SiO2 or Al2O3 chamber materials Small footprint The highest available plasma power density Extremely low source-to-source variability