The Litmas® RPS is the only fully integrated, remote, inductive plasma source and power-delivery system available in a high-conductance, low-surface-area geometry. It is well suited to deliver reactive gas species to processes such as wafer pre-clean, photoresist strip, and atomic layer deposition (ALD). In addition, its high power density and high conductance make it the ideal platform for post-process exhaust gas abatement.
The Litmas RPS delivers up to 3 kW of stable radio-frequency (RF) power in less than 3 msec, enabling faster changing, sub-90 nm and 300-mm processes.
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Benefits |
Features |
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Reduced charge damage to fragile device structures
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High reactive specie flux generation
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Broad range of process chemistries
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Fast-matching, stable power delivery
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Reduced CoO
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Enhanced end-user process development and yields
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Integrated power supply, match, and plasma chamber
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Patented LitmasMatch™ solid-state power-delivery topology
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Plug-and-play installation
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Uniquely wide matching range
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Durable SiO2 or Al2O3 chamber materials
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Small footprint
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The highest available plasma power density
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Extremely low source-to-source variability
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