Paramount® RF Power-Delivery Systems
The half-rack, 3 kW Paramount® RF power supply features an enhanced power and impedance measurement system that delivers exceptional power accuracy and control at 13.56 MHz fixed or variable frequencies into 50 Ω and non-50 Ω loads, beyond 3:1 VSWR. Able to keep pace—in real time—with the most abrupt plasma-impedance changes, the Paramount RF power-delivery system enables faster transitions, shorter process steps, and reduced process times for next-generation technology nodes. Its impedance measurement rivals the accuracy of a network analyzer, while optional frequency tuning tunes virtually instantaneously (i.e. msec), faster than any other product on the market. The result is truly unprecedented accuracy, repeatability, and process control.
| Benefits |
Feature |
- Optimizes film uniformity and throughput with unprecedented
power-delivery accuracy
- Enables next-generation etch and deposition processes with faster
process transitions
- Facilitates seamless process transitions
- Enhances yield
- Maximizes ROI
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- Next-generation measurement system, enabling ultra-accurate power and impedance measurement across the full output range—at 50 Ω and off 50 Ω
- Near-instantaneous frequency tuning (optional)
- Optional pulse and pulse synchronization with the widest pulse frequency range available
- Optional HALO (high accuracy, low output) and arc-management system
- Compact, half-rack package
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