AE’s family of pulsing products covers a spectrum of capabilities to meet all of your difficult and varying process requirements. This flexible collection of
DC pulsing accessories provides power from 10 to 200 kW as well as fixed and variable frequencies from 2 to 100 kHz. Each member of this family is designed with features that deliver proven benefits for reactive and conductive
DCsputtering.
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Benefits |
Features |
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Increase throughput by permitting operation at higher powers
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Reduce target contamination
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Improve deposition and yield rates in reactive and metal processes
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Increase deposition time by reducing or eliminating arcing
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Improve uniformity—by 50% in may reactive processes
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Improve film properties—making denser, tougher, brighter, and more transparent films
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Significantly reduce particle contamination
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Superior arc control—in many cases arcs are completely eliminated
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Higher ion energy
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Higher power operation
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Lower substrate temperature
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Lower target temperature
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Process flexibility and latitude
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Easy system integration
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Dual-cathode capability (Astral® products)
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