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Advanced Energy
A global leader in innovative power and control technologies that drive high-growth, plasma thin-film and nontech manufacturing processes.
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DC POWER SYSTEMS 
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DC Pulsing Product Suite

AE’s family of pulsing products covers a spectrum of capabilities to meet all of your difficult and varying process requirements. This flexible collection of DC pulsing accessories provides power from 10 to 200 kW as well as fixed and variable frequencies from 2 to 100 kHz. Each member of this family is designed with features that deliver proven benefits for reactive and conductive DCsputtering.


Benefits Features
  • Wide variety of capabilities
  • Flexible collection of DC pulsing accessories 
  • Increases throughput by permitting operation at higher powers 
  • Reduces target contamination
  • Provides power from 10 to 200 kW 
  • Provides fixed and variable frequencies from 2 to 100 kHz 
  • Superior arc control-in many cases arcs are completely eliminated 
  • Higher ion energy 
  • Higher power operation 
  • Lower substrate temperature 
  • Lower target temperature 
  • Process flexibility and latitude 
  • Easy system integration 
  • Dual-cathode capability (Astral® products)


Literature Downloads

DC Pulsing Products: Proven Benefits for Reactive & Conductive Sputtering brochure      Japanese Version
Guidelines for Using a Pulsar DC Pulsing Accessory with an SCR-Fired DC Power Supply (2007) application note     Chinese Version
Pulsar High-Power DC Pulsing Accessory (2006) application note     Chinese Version   Japanese Version
Arc Handling in RF-Superimposed DC Processes (2006) application note
Increasing Production Output with Pulsed-DC Accessories (2006) white paper
Signal Integrity for Vacuum Processing Systems (2003) white paper
Redundant Anode Sputtering: A Novel Approach to the Disappearing Anode Problem (2000) white paper
The Evolution of Power Delivery in Reactive Silicon Sputtering (1999) white paper
Effects of the Anode Configuration on Substrate Heating in Dual-Magnetron Sputtering (1999) white paper
Power Supplies for Pulsed Plasma Technologies: State-of-the-Art Outlook (1999) white paper
Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen (1999) white paper
Advances in Arc-Handling in Reactive and Other Difficult Processes (2001) white paper
Introducing Power Supplies and Plasma Systems (2001) white paper
Arcing Problems Encountered During Sputter Deposition of Aluminum (2000) white paper
Reactive Sputter Deposition of Aluminum Oxide Coatings, April 2004 magazine reprint
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects, April 2000 magazine reprint
Fabs can ride through voltage sags with power-quality targets, July 2004, magazine reprint
Partial Pressure Control in Reactive Sputtering, June 2004 magazine reprint
An Economical Method for Process Control in Pulsed-DC Magnetron Reactive Sputtering, June 2003 magazine reprint
Power Supplies Advance Beyond Volts and Amps, June 2003 magazine reprint
AE Global Services data sheet

 

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