The Advanced Energy® (AE) Crystal® resonant-circuit power supply is ideally suited for large-area glass coating, such as architectural, automotive, anti-reflective, and mirror applications. The Crystal platform is available in 60, 120, and 180 kW power levels, providing wide-range, mid-frequency sinusoidal process power for dual magnetron sputtering. Designed specifically for use in a plasma environment, the Crystal power supply produces stable, low-arc energy and compensates for plasma variations—increasing throughput and film quality while maximizing target utilization.
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Benefits |
Features |
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Optimized process stability and yield
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Enhanced flexibility
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Increased throughput
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Reduced cost of ownership
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World-class service, support, and training
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60 kW, 120 kW, and 180 kW models
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Lowest stored energy in the industry (1 mJ per kW)
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Fastest arc detection and response in the industry (microsecond scale)
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Wide output impedance range
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Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
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Single-box solution—no hardware or setting changes required when changing sputtering materials
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Wide tap range (2: 1 voltage range at full power on single tap)
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Multiple taps with high strike (>3000 V)
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