Photo of Crystal® AC Power Supply
Precise power control is essential for high-density, uniform, reactively sputtered films. The Crystal® power supply offers process engineers and operators a repeatable method for improving throughput and yield with quick yet stable power, fast arc detection, and low arc energy. With power granularity from 60 to 180 kW, it is certain to match the demands of your low-e coating applications.
Benefits Features
  • Optimized process stability and yield
  • Enhanced flexibility
  • Increased throughput
  • Reduced cost of ownership
  • World-class service, support, and training
  • 60, 100, 120, 150, and 180 kW models
  • Lowest stored energy in the industry (1 mJ per kW)
  • Fastest arc detection and response in the industry (microsecond scale)
  • Wide output impedance range
  • Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
  • Single-box solution—no hardware or setting changes required when changing sputtering materials
  • Wide tap range (2: 1 voltage range at full power on single tap)
  • Multiple taps with high strike (>3000 V)
  • Power, current, and voltage regulation modes
  • Control and interface flexibility