Crystal®
The Advanced Energy® (AE) Crystal® resonant-circuit power supply is ideally suited for large-area glass coating, such as architectural, automotive, anti-reflective, and mirror applications. The Crystal platform is available in 60, 120, and 180 kW power levels, providing wide-range, mid-frequency sinusoidal process power for dual magnetron sputtering. Designed specifically for use in a plasma environment, the Crystal power supply produces stable, low-arc energy and compensates for plasma variations—increasing throughput and film quality while maximizing target utilization.
| Benefits |
Features |
- Optimized process stability and yield
- Enhanced flexibility
- Increased throughput
- Reduced cost of ownership
- World-class service, support, and training
|
- 60 kW, 120 kW, and 180 kW models
- Lowest stored energy in the industry (1 mJ per kW)
- Fastest arc detection and response in the industry (microsecond scale)
- Wide output impedance range
- Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
- Single-box solution—no hardware or setting changes required when changing sputtering materials
- Wide tap range (2: 1 voltage range at full power on single tap)
- Multiple taps with high strike (>3000 V)
|
Literature Downloads
The information on this page was helpful. (1 - Strongly disagree, 5 - Strongly agree)
1 2 3 4 5
How can we improve the information on this page?