Advanced Energy provides high-value, reliable power conversion and controls for thin-film manufacturing companies around the world. We combine the insight and innovation that comes from decades of specialized power conversion leadership to help our customers innovate, compete, and reach beyond their business goals. Around the world, our customers rely on us for partnership, peace of mind, and unmatched service and support.
More than three decades of technology leadership
Extensive intellectual property
Robust global infrastructure
Best-in-class manufacturing facilities in the U.S., China, and Korea
Responsive service worldwide
The Ascent® DMS dual-magnetron sputtering accessory is an exciting power-conversion advancement that further refines process control and productivity for our customers in a way that will help shape new innovation in the long-established field of sputtering. This series offers repeatable, tunable film parameters and lowers cost of ownership in large-area glass, solar, flat panel display, AMOLED display, and other industrial, dual-magnetron sputtering applications. Designed to deliver 30 to 180 kW of bipolar power—with independent power control to each cathode—Ascent DMS units permit process engineers to customize duty cycle to the wear profile of each target. This enables increased target-erosion uniformity and full utilization of each cathode for longer campaigns. A controllable pulse rise feature offers significant advantages for producing more uniform and higher density films, while unique power-delivery options include selectable frequency, independent power-ratio regulation for each magnetron and power, current, or voltage regulation.
DC control for AC processes
Balanced target material utilization for dual magnetrons
Controlled film density, uniformity, transmission, and resistivity for your applications
Enabling Advances in Industrial Tribological Coatings: The Role of Power Systems for Source and Bias
G. Eichenhofer, Metzingen, Germany; A. Bulliard, S.B. Larson, and B.D. Fries, Advanced Energy Industries, Inc.
Tuesday, May 6, 1:00 P.M.
Interoperability, Synchronization, and Synergy: The Next Step in Process Control
B.D. Fries, D.R. Pelleymounter, and D.J. Christie, Advanced Energy Industries, Inc.
Tuesday, May 6, 1:00 P.M.
Towards More Efficient Dual Magnetron Sputtering (DMS): Strategies for Reducing Cost of Ownership
D.J. Christie and S.B. Larson, Advanced Energy Industries, Inc.
Wednesday, May 7, 11:20 A.M.
Measurement and Simulation of a VHF Remote Plasma Source
D. Carter and S. Polak, Advanced Energy Industries, Inc.
Thursday, May 8, 10:00 A.M.
Pulsed DC Power for Magnetron Sputtering: Strategies for Maximizing Quality and Flexibility
D.R. Pelleymounter, D.J. Christie, and B.D. Fries, Advanced Energy Industries, Inc.
Thursday, May 8, 2:40 P.M.
Editors interested in meeting with AE may contact Bates Marshall at +1.408.574.2534 .
or call 800.446.9167 (U.S.) or +1.970.221.0108.