For more information, contact:

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

Angie Kellen MCA 650.968.8900 akellen@mcapr.com

FORT COLLINS, Colo., June 22, 2004—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today unveiled its next-generation Litmas™ RPS 1501 linear-inductive remote plasma source for advanced thin-film processes. Especially well-suited for wafer pre-clean, photoresist strip, gate dielectric deposition and atomic layer deposition (ALD) applications, the Litmas RPS 1501 also facilitates the development of a wide variety of other advanced process applications. Specifically, its plug-and-play installation, uniquely wide matching range and small footprint reduce time-to-market for new chamber development.

AE’s Litmas RPS 1501 is the only fully integrated, remote, inductive plasma source and power delivery system available in a high-conductance, low-surface-area, linear geometry. The platform’s solid-state power-matching design delivers up to 1.5 kW of stable radio-frequency (RF) power in less than 3 milliseconds, enabling faster changing processes, reducing process variability and improving yields for advanced sub-90 nm and 300 mm applications. Moreover, its extremely low source-to-source variability enhances end-user process development and yields.

According to Advanced Energy Chairman and CEO Douglas Schatz, “The new Litmas RPS 1501 is a high-performance addition to AE’s portfolio of remote plasma sources. Along with our Xstream™ RPS with Active Matching Network™, the Litmas RPS broadens our ability to help customers enable their advanced processes and improve yields.”

Steve Rhoades, senior vice president and general manager of AE’s core product groups, noted, “The Litmas RPS is a great example of AE’s continuing commitment to increasing our customers’ competitive advantage. The Litmas RPS does this by directly enabling new, sub-90 nm process development as well as existing process improvements.”

Litmas™ RPS 1501 Technology and Capabilities
Using the patented LitmasMatch™ topology to couple the 2 MHz power from the field-effect transistors (FETs) of the power amplifier circuit, the Litmas RPS design delivers RF power in an inherently more efficient manner than traditional RF plasma systems that convert power through a 50-ohm cable. The feedback and control circuit utilized in the LitmasMatch topology allows the platform to dynamically adjust the timing of the FETs to maintain proper operation even as plasma loads vary substantially and rapidly with changes in pressure, power or chemistry. Further, the source chamber, which is available in both low-recombination quartz and durable alumina configurations, uses a patented, ringing-coil antenna design that maximizes ignition in multiple chemistries.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow management, thermal instrumentation and plasma and ion beam sources for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. More information can be found at www.advanced-energy.com

Advanced Energy^®, AE^®, Litmas™, Xstream™, Active Matching Network™ and LitmasMatch™ are trademarks of Advanced Energy Industries.