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Orders broaden AE’s installed base of Aera digital MFCs for the semiconductor industry

FT COLLINS, Colo., February 3, 2004—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that its Aera® FC-PA780C digital mass flow controller (MFC) has been named the default standard by one of Japan’s largest semiconductor manufacturers for use in 300mm high-density plasma chemical vapor deposition (HDPCVD) applications. This design win further extends Aera-brand market leadership for AE and expands its installed base of digital MFCs worldwide.

The increasingly stringent requirements for today’s 300mm HDPCVD processes demand ever more precise control of the gas flow into the process chamber. To ensure that the Aera FC-PA780C MFC met these tight specifications, AE worked in close cooperation with this Japanese customer to ensure the highest accuracy, reliability and performance possible. As a result, the customer’s upgrade to Aera digital, multi-gas, multi-range MFCs provided a flow control solution that outperformed other MFCs, providing superior accuracy throughout the entire control range.

According to Steve Rhoades, vice president and general manager of AE’s Control Systems and Instrumentation group, “AE is experiencing more pull-through demand from chipmakers as they seek dependable suppliers with process expertise for their critical process solutions. By working closely with this customer early in the development process, we were able to deliver a high-performance, versatile digital MFC solution best suited to their customers’ requirements. This design win is thus significant not only because it further validates the superior technology and versatility of the Aera FC-PA780C—it also exemplifies AE’s commitment to providing customers with superior service and support before, during and after the sale.”

Aera FC-PA780C MFC
The field-proven design of Aera’s FC-PA780C as a highly reliable and accurate digital MFC enables improved efficiency for today’s most complex processes. With the ability to be easily programmed in the field for multiple gases over multiple control ranges, it provides a configurable and cost-effective alternative to older analog MFC designs and reduces spare MFC inventory requirements. The high-purity metal-sealed FC-PA780C delivers a +1% of set point accuracy with a response time of <1 second, and has RS-485 digital communications for configuration or digital control.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass, and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow and thermal management, plasma and ion beam sources, and integrated process monitoring and control for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. For more information, please visit our corporate Website: www.advanced-energy.com