For more information, contact:
Jim Donaldson
Advanced Energy Industries, Inc.
970.407.6374 |
Marna Shillman
Advanced Energy Industries, Inc.
970.407.6280
marna.shillman@aei.com |
FORT COLLINS, Colo., Aug. 5, 2003—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that its Apex
® radio frequency (RF) integrated power delivery systems have been selected as the default standard on plasma-enhanced chemical vapor deposition (PECVD) systems by one of the world’s leading semiconductor equipment manufacturers. The designation was awarded to the Apex 3 kW, 13.56 MHz power system with integral matching network. These compact, single-box systems deliver matched power to the chamber over a very wide impedance range, enabling the customer to cost-effectively run a broad array of deposition processes with one efficient, chamber-mounted power system. A long-time customer of AE, the equipment maker will use the Apex power systems on a number of its key PECVD processes.