For more information, contact:

Jim Donaldson Advanced Energy Industries, Inc. 970.407.6374

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

Fort Collins, Colo., Dec. 10, 2002—Advanced Energy (Nasdaq: AEIS) today introduced the Pinnacle^® 3000 DC power supply, designed specifically for both sputtering and bias applications. The Pinnacle 3000 supply offers a high feature set that enables precision optical coatings, hard disk thin film deposition and other related PVD applications. The Pinnacle 3000 supply is half-rack in size, yet it delivers process consistency and control that reduces process variation and improves yields.

Brenda Scholl, senior vice president of AE’s Power Systems technology group, said, “The Pinnacle 3000 introduction brings all of the process precision of the flagship Pinnacle platform into a smaller, lower cost package. We remain continuously focused on adding value to our customers. The feature-packed Pinnacle 3000 supply is a great example of AE’s ongoing commitment to deliver best-of-breed technology to our customers.”

The Pinnacle 3000 supply delivers the highest efficiency and power factor available, resulting in the lowest operating and installed cost in the industry. It features user-selectable and programmable parameters, up to 3000 watts of power from less than 50 to 1000 VDC with no tap changes, and it can minimize conditioning time for new targets. In addition, the Pinnacle 3000 supply has fast, configurable arc response (ten times faster than competitive units), and its sophisticated arc handling capabilities enable users to program voltage trip level, delay-to-shutdown and shutdown time to match any process.

About Advanced Energy
Advanced Energy is a global leader in the development, marketing and support of components and sub-systems critical to plasma-based manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass, and other applications that require precise thin-film processes. AE offers a comprehensive line of technology solutions in power, flow and thermal management, plasma and ion beam sources, and integrated process monitoring and control to original equipment manufacturers (OEMs) and end-users around the world. AE operates in regional centers in North America, Asia and Europe, and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly-held company traded on Nasdaq National Market under the symbol AEIS. For more information, please visit our corporate website: www.advanced-energy.com