For more information, contact:

Jim Donaldson
Advanced Energy Industries, Inc.
970.407.6374
Marna Shillman
Advanced Energy Industries, Inc.
970.407.6280
marna.shillman@aei.com

Advanced Energy Unveils Mach One™ i Next-Generation Mass Flow Controller

Optimized for 300 mm Toolsets, New Pressure-Insensitive Controller’s Advanced Capabilities Reduce Gas-Panel Footprint by 30 Percent, Costs by 25 Percent

LONGMONT, Colo., Dec. 5, 2001—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today introduced the Mach One™ i—its next-generation pressure-insensitive mass flow controller (PIMFC), offering semiconductor original equipment manufacturers (OEMs) significant cost, footprint and ease-of-use advantages over conventional MFCs. Developed by EMCO Flow Systems, an Advanced Energy company, the highly advanced Mach One i PIMFC is a production-ready, pressure-based system that combines, in a simple, innovative design, the capabilities of its predecessor with communication and flow-rate enhancements. Its resulting benefits make the Mach One i an optimal choice for 300 mm toolsets in key process-technology markets, such as etch and chemical vapor deposition (CVD).

Advanced Energy Industries, Inc. (Nasdaq: AEIS) today introduced the Mach One™ i—its next-generation pressure-insensitive mass flow controller (PIMFC), offering semiconductor original equipment manufacturers (OEMs) significant cost, footprint and ease-of-use advantages over conventional MFCs. Developed by EMCO Flow Systems, an Advanced Energy company, the highly advanced Mach One i PIMFC is a production-ready, pressure-based system that combines, in a simple, innovative design, the capabilities of its predecessor with communication and flow-rate enhancements. Its resulting benefits make the Mach One i an optimal choice for 300 mm toolsets in key process-technology markets, such as etch and chemical vapor deposition (CVD).

“As they plan for the inevitable transition to 300 mm wafer manufacturing, OEMs are seeking innovative ways to reduce tool costs,” said Kaveh Zarkar, vice president of AE’s semiconductor flow division. “The gas panel represents a significant percentage of a tool’s total cost. By designing an integrated, best-of-breed solution that greatly simplifies and streamlines the process of gas delivery and delivers significant cost savings, we believe we have developed a product that will ultimately enable Advanced Energy to become the market leader in ultra-high purity (UHP) mass flow measurement and control.”

The Mach One i already has been specified as a standard option for one of a major OEM customer’s key product lines, representing a significant milestone for Advanced Energy as it seeks to grow its market share in mass flow control.

With its patented digital sonic nozzle, the Mach One i features a true 50:1 dynamic range—wider than any other available MFC—minimizing the need for multiple mass flow controllers to accommodate tool OEMs’ multiple process recipes. A key enhancement, the Mach One i on-board pressure/temperature and flow indicator eliminates the need for external pressure regulators, pressure transducers and local displays. As a result, OEMs can reduce their tools’ gas panels, or gas stick footprints by 30 percent and costs by 20 to 25 percent. And because it is pressure- rather than small bore capillary-based, the Mach One i mass flow controller has fewer mechanical parts, offering greater reliability compared to traditional capillary-based thermal MFCs.

Innovative Design Drives Demand
The design of the Mach One i reflects the EMCO engineering team’s extensive expertise, including experience gained from working with large-scale sonic-nozzle technology at the National Institute of Standards and Technology (NIST). Over a development period of five years, the team discovered a manufacturable way to miniaturize the sonic nozzle for the chipmaking arena, then developed the patented digital-valve technology with which the nozzle is combined to form the heart of the Mach One i’s design.

About Advanced Energy
Advanced Energy is a global leader in the development, marketing and support of technology solutions that are central in the manufacture of semiconductors, data storage products and flat panel displays. Original equipment manufacturers (OEMs) and end-users around the world depend on AE products when plasma-based technology plays a vital role in their manufacturing process. AE offers a comprehensive suite of products for vacuum process systems, including power management, temperature sensing, dynamic temperature control, gas delivery management, process monitoring and machine control tools, ion-beam sources, and plasma abatement technologies. AE technology solutions are sold and supported globally by direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq under the symbol AEIS. AE’s URL is www.advanced-energy.com.