For more information, contact:

Joe Monkowski Advanced Energy Industries, Inc. 970.407.6252

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

June 9, 1999—A new generation of ion-beam sources with industrial, low maintenance, high yield functions has been introduced by Advanced Energy Industries, Inc. (Nasdaq: AEIS). Advantages to end users include improved process performance, quality, and cost of ownership over previous source technologies. The product line includes multi-cell sources (for rotating and stationary substrates) and linear sources (for in-line systems).

Benefits

• No filaments or hollow cathodes
• No grids or ion optics
• Reactive gas compatible
• Industrial, low maintenance design
• Field proven dc power supply
• Easily retrofittable

Applications

• In situ pre-clean and etch with inert gases (e.g., Ar) and reactive gases (e.g., O2) as well as chemically-assisted in situ etch
• Direct deposition of films and overcoats using precursors (e.g., hydrocarbons and metalorganic compounds)
• Assisted deposition for optical, R&D, and semiconductor processes which use low-pressure deposition sources, lasers, or electron beams

Copies of the brochure describing these ion sources are available at no charge by sending a request via e-mail to sales.support@aei.com or from the web at advanced-energy.com.

Advanced Energy Industries, Inc. is a leading developer and manufacturer of power supplies and related products that are critical in the manufacturing of semiconductors, data storage devices, flat panel displays, and other industrial products using thin-film technology such as glass coatings, decorative coatings, and optical coatings. Founded in 1981, AE is a publicly held company traded on Nasdaq, symbol, AEIS. Its web site address is advanced-energy.com.