For more information, contact:

Joe Monkowski Advanced Energy Industries, Inc. 970.407.6252

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

June 3, 1999—A cost-reduced 3000 W variable frequency generator designed primarily for use with 200 mm and 300 mm wafer processing equipment has been introduced by Advanced Energy Industries, Inc. (Nasdaq: AEIS). The new HFV-L is especially suited for PVD, PECVD, etch, and other inductively coupled plasma (ICP) applications.

The HFV-L provides flexibility though digitally-synthesized variable frequency output and microprocessor control. The output frequency range is 1.765 MHz to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure reliable operation with a wide variety of chamber configurations and process recipes.

Features

• 2 MHz, digitally synthesized variable frequency
• Load power or forward power regulation modes
• 3 kW output level
• Internal diagnostics to verify proper operation
• Standard rack dimensions with 5¼-inch height
• Water cooled for reliable and consistent operation

Copies of the brochure describing these variable frequency generators are available at no charge by sending a request via e-mail to sales.support@aei.com or from the web at advanced-energy.com.

Advanced Energy Industries, Inc. is a leading developer and manufacturer of power supplies and related products that are critical in the manufacturing of semiconductors, data storage devices, flat panel displays, and other industrial products using thin-film technology such as glass coatings, decorative coatings, and optical coatings. Founded in 1981, AE is a publicly held company traded on Nasdaq, symbol, AEIS. Its web site address is advanced-energy.com.