For more information, contact:
Jim Donaldson
Advanced Energy Industries, Inc.
970.407.6374 |
Marna Shillman
Advanced Energy Industries, Inc.
970.407.6280
marna.shillman@aei.com |
June 28, 1999—The RFMS RF Metrology System, which solves many problems process engineers encounter with CVD and etch tools, is now available from Advanced Energy Industries, Inc. (Nasdaq: AEIS). The RFMS system allows tools to accommodate new processes and smaller geometries. It increases product yields and lowers costs by solving—and implementing controls for—these historically difficult problems:
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End-point detection
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Within wafer excursion detection
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Wafer-to-wafer excursion detection