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“The Evolution of RF Power Delivery in Plasma Processing” discusses the role of radio frequency technology in plasma processing for critical high-density CVD and PECVD deposition, etch, and PVD processes. The paper details the use of linear and switching design technologies for applications including semiconductor manufacture, IC fabrication, thin-film heads for disks, CDs, and hard disk coatings.

The authors provide an overview of the advantages fixed match technology brings to process repeatability and RF system reliability, as well as a discussion of the fully integrated RF power delivery system, the most recent RF power technology breakthrough.

Authors of the paper are: Randy Heckman, director of RF engineering; Gregory Roche, director of applications research and development, and James R. Usher, previously business unit director for the worldwide semiconductor market and now president and chief operating officer of Busch Semiconductor Equipment Group, Inc.

Copies of this paper are available at no charge by sending a request via email to: support@aei.com.

Advanced Energy Industries, Inc., is a leading developer and manufacturer of power supplies and related products that are critical in the manufacturing of semiconductors, data storage devices, flat panel computer displays, and other products using thin-film technology. Founded in 1981, Advanced Energy is a publicly held company with 1997 annual revenues of $141.9 million. Its symbol on NASDAQ is AEIS. The Web site address is www.advanced-energy.com.