For more information, contact:

Jim Donaldson Advanced Energy Industries, Inc. 970.407.6374

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

Fort Collins, Colorado (October 18, 1999) – The next generation of pulsed dc process power solutions, the Pinnacle Plus+ series, is now available from Advanced Energy Industries, Inc. (Nasdaq NM: AEIS) for critical reactive processes. A technologically advanced dc alternative to RF sputtering, it delivers high quality films with high output accuracy and process repeatability that is critical in reactive processes.

Innovative Features and Benefits

• Individually controllable dual-output pulsed dc power from a single unit
  -Provides a cost-effective solution for multi-chamber production
• Increased process flexibility<
  -Incorporates an extended frequency range of 5 kHz to 350 kHz
  -Full power over a wide impedance range with high current at low voltage
  -50% duty cycle—the highest available—enables bi-polar pulsed dc operation
• More repeatable process performance
  -Integrated microprocessor
• Active front panel
  -Provides easy access to critical parameters
• Meets CE requirements

Advanced Energy is a worldwide leader in the development and marketing of power conversion and control system solutions, ion-beam sources, and plasma abatement systems. Customers throughout the world use Advanced Energy’s products where plasma-based thin film technology is a critical function in their manufacturing process. This would include the manufacture of semiconductors, CD-ROMs, DVDs, compact disks, flat panel displays, disk drives, optical and architectural glass. In addition, Advanced Energy provides the power conversion and control system solutions of choice to a growing number of general applications in the medical, telecommunications, automotive, food packaging and tool industries. Founded in 1981, AE is a publicly held company traded on NASDAQ under the symbol AEIS.