For more information, contact:
FORT COLLINS, Colorado (November 4, 1997)
Advanced Energy Industries, Inc.
—AE’s new RFG 3001 continues the application of AE’s patented RF circuit topology to deliver up to 3000 W into a 50-ohm, non-reactive load. Plasma process tool applications for the RFG 3001 include plasma etch and deposition, reactive ion itch (REI), RF sputtering, RF bias, and other related plasma processes. The RFG 3001 provides high-accuracy forward-power and delivered-power regulation. The RFG 3001 is certified by CE, UL/CSA, GS, and is Semi S2-compliant.