Advanced Energy
Advanced Energy
A global leader in innovative power and control technologies that drive high-growth, plasma thin-film and nontech manufacturing processes.
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DC POWER SYSTEMS
Photo of Pinnacle(R) Plus+ Pulsed-DC Power Supply
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Pinnacle® Plus+ Pulsed-DC Power Supplies

The Advanced Energy® (AE) Pinnacle® Plus+ power supply provides all of the advantages of a pulsed-DC solution for your reactive processes—in a one-box package that delivers additional benefits in the form of ease of use, cost savings, and superior flexibility. Combining standard DC technology and process-proven pulsed-DC technology patented by AE in the 1990s, the Pinnacle Plus+ power supply provides higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions. The Pinnacle Plus+ product line consists of single-output 5 kW and 10 kW models, as well as a dual output 5 kW model.

Benefits Features
  • Higher deposition and yield rates 
  • Superior film uniformity and quality 
  • Reduced substrate damage caused by arcing 
  • Lower cost 
  • Easy system integration 
  • Excellent process flexibility and latitude 
  • Repeatable performance 
  • Stable operation high on the transition curve 
  • Higher throughput 
  • Convenient monitoring and control 
  • Unmatched system flexibility
  • One compact package 
  • Adjustable frequency range of 5 to 350 kHz 
  • Variable duty cycle up to 45% 
  • Wide voltage range—single-tap wide impedance range 
  • High-power operation 
  • Low substrate heating 
  • Superior arc control  
  • Dual output for multi-chamber production 


Literature Downloads

Pinnacle® Plus+Pulsed-DC Power Supply brochure      Chinese Version
DC Pulsing Products: Proven Benefits for Reactive & Conductive Sputtering brochure      Japanese Version
Arc Handling in RF-Superimposed DC Processes (2006) application note
Increasing Production Output with Pulsed-DC Accessories (2006) white paper
Signal Integrity for Vacuum Processing Systems (2003) white paper
The Evolution of Power Delivery in Reactive Silicon Sputtering (1999) white paper
Power Supplies for Pulsed Plasma Technologies: State-of-the-Art Outlook (1999) white paper
Advances in Arc-Handling in Reactive and Other Difficult Processes (2001) white paper
Introducing Power Supplies and Plasma Systems (2001) white paper
Control of the Reactive Sputtering Process Using Two Reactive Gases, May 2003 magazine reprint
Integrated Process Control for Reactive Sputter Deposition of Dielectric Thin Films, May 2003 magazine reprint
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects, April 2000 magazine reprint
Optical Emission Studies for the Characterization of Pulsed Magnetron Sputtering Systems, April 2002 magazine reprint
Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide, April 2002 magazine reprint
Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering, April 2002 magazine reprint
Fabs can ride through voltage sags with power-quality targets, July 2004 magazine reprint
A Novel Frequency-Domain Small-Signal Analysis of Resonant Power Converters, July 2004 magazine reprint
Power Supplies Advance Beyond Volts and Amps, June 2003 magazine reprint
DC Sputtering Cuts Deposition Times and Costs, November 2002 magazine reprint
Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen, March 2001 magazine reprint
AE Global Services brochure

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