The Ovation^™ fully-integrated, power delivery system enables faster, higher-precision processes, such as those required for demanding narrow-linewidth, dielectric etch processes, through the implementation of a unique power delivery scheme. It is the first to accurately deliver power into a non-50-ohm environment without an external sensor, reacting faster than traditional power supplies. The 60-MHz design reduces voltage potential across the plasma sheath, minimizing ion etch damage, thus improving film quality and yields.

Benefits	Features
Broadens process windows  Expands process capabilities  Improves plasma characteristics  Increases etch rate, selectivity, and uniformity  Reduces Cost of Ownership	2760 W, 60 MHz (contact factory for higher power requirements)  Sweep frequency  Non-50 Ù measurement capability  Analog, RS-232, and Ethernet control options  Smaller footprint—half rack option for power up to 2.7 kW  Highly stable and reliable  Expert applications support