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Advanced Energy
A global leader in innovative power and control technologies that drive high-growth, plasma thin-film and nontech manufacturing processes.
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DC POWER SYSTEMS 
Photo of MDX Series 1 kW and 1.5 kW DC power system
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MDX Series 1 kW and 1.5 kW

Tight regulation, superior arc quenching, and low stored output energy make MDX Series DC power supplies an industry leader. Intended for continuous hard use in a vacuum environment, these rugged power supplies are most commonly used as DC magnetron sputtering drives. They also offer tight regulation as bias supplies in RF sputtering and etching systems. Their compact design makes them the primary choice for laboratory systems.
Benefits Features
  • Tight regulation
  • Improved yield
  • Reduced target burn-in time
  • High reliability
  • Easy maintenance and replacement
  • Low stored output energy
  • Low ripple
  • Adjustable arc suppression time
  • High efficiency
  • Compact design
  • Voltage, current, and power regulation modes
  • Front panel and analog interface control
  • Full range of protection features


Literature Downloads

MDX Series 1 kW and 1.5 kW DC Power Systems brochure
MDX Series 500 W Magnetron Drive brochure
DC Pulsing Products: Proven Benefits for Reactive & Conductive Sputtering brochure 
DC through Low-Frequency Power-Delivery Essentials data sheet
Increasing Production Output with Pulsed-DC Accessories (2006) white paper
Signal Integrity for Vacuum Processing Systems (2003) white paper
Advances in Arc-Handling in Reactive and Other Difficult Processes (2001) white paper
How Advanced Energy's MDX Products Manage Arcs (2001) white paper
Introducing Power Supplies and Plasma Systems (2001) white paper
Fabs can ride through voltage sags with power-quality targets, July 2004 magazine reprint
Power Supplies Advance Beyond Volts and Amps, June 2003 magazine reprint
Future Trends in Integrated Systems...Change the View, May 2003 magazine reprint
Biased Dual Magnetron Sputter Deposition of Alumina, April 2002 magazine reprint
Reactive Sputtering Using a Dual-Anode Magnetron System, April 2001 magazine reprint
Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen, March 2001 magazine reprint
Single-Magnetron Approach Reactive Sputtering of Dielectrics, September 2000 magazine reprint
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects, April 2000 magazine reprint

AE Global Services data sheet

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