LFGS RF Generators
The versatile, variable-frequency LFGS RF generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.
| Benefits |
Features |
- Versatile—suits a wide variety of applications
- Lowest reflected power commercially available
- Easy installation
- Efficient use of valuable space
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- Variable frequency
- Air cooling
- Enhanced operating menu
- Active front panel
- Pulse mode (0 to 10 kHz)
- CEX operation mode
- 2 analog user ports
- RS-232, Ethernet, and Profibus communication
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