The versatile, variable-frequency LFGS RF generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.
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Benefits |
Features |
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Versatile—suits a wide variety of applications
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Lowest reflected power commercially available
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Easy installation
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Efficient use of valuable space
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Variable frequency
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Air cooling
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Enhanced operating menu
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Active front panel
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Pulse mode (0 to 10 kHz)
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CEX operation mode
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2 analog user ports
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RS-232, Ethernet, and Profibus communication
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