Used primarily as a plasma generator for 200 and 300 mm wafer processing, flat panel display (FPD), and DVD equipment, the flexible HFV^® generator offers process consistency for ionized physical vapor deposition (IPVD), CVD, and etch. This versatile power generator’s features include digitally synthesized variable-frequency output and microprocessor control, with output power levels of 5 and 8 kW. In addition, it delivers an output frequency range of 1.765 to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure repeatable operation with a wide variety of chamber configurations and process recipes.