The Litmas^® RPS system is a foreline abatement solution that reduces the global warming footprint in semiconductor processing. This high-performance, linear-inductive plasma source fully integrates a 2 MHz power supply and matching circuitry. It accommodates wide impedance operating ranges in CVD, etch, and ash applications.

Benefits	Features
Effective abatement of environmentally-harmful PFC gases, with high destruction efficiency Reduced overall abatement costs Minimal foreline pressure effects Maximum power efficiency and process flexibility Consistent performance and reliability in a broad range of chemistries  Seamless integration, with no process impact	Linear inductive plasma source and advanced power-delivery system Compact, integrated design Low water and power consumption (no fuel required) High-conductance, fluorine-resistant, cylindrical ceramic chamber Zero sub-fab footprint