The Advanced Energy E'Wave^® bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, including wafer electroplating in a production environment and copper process development. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.