The Advanced Energy E'Wave
® bipolar pulsed
DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, including wafer electroplating in a production environment and copper process development. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.
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Benefits |
Features |
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Excellent gap fill
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Superior surface uniformity
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Reduced additive consumption
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Powerful control and monitoring
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Reduced cleanroom space requirements
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Extensive placement options
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Versatile waveform construction
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Up to three independently-controlled channels
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Bipolar pulsed DC output, 0 to 5 kHz
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High-current capability
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Four-terminal control and measurement of voltage at the wafer
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Host port interface
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Compact package
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