The Aera^® AS-71 thermal vaporizer system features industry-leading reliability and flow stability-resulting in measurably improved film uniformity and increased system uptime.  Unlike units that require constant refill pressures and frequent maintenance, AS-71C vaporizers enable consistent delivery of vaporized TEOS, SiCI4, HCD, and other precursor materials with minimal upkeep and no need to constantly monitor refill pressures.  Ideal for the 300 sccm range, they provide flows up to 600 sccm.

Aera AS-71C vaporizers integrate leading thermal-chamber and MFC technologies with the exceptional design and manufacturing quality you've come to expect from Aera products.  The result is a highly reliable, low-maintenance system that increases uptime, process repeatability, and film uniformity for semiconductor, FPD, other advanced applications that require high vapor-delivery stability.

Benefits	Features
Enable highly consistent, repeatable film characteristics Facilitate process innovation Increase process uptime and throughput Reduce material cost and process complexity Increase ease of use	Industry-leading vapor-flow stability Thermal vaporization method-inherently stable and resilient performance, with minimal maintenance High reliability-over 20 years of dependable operation in the field Integrated high-temperature Aera® MFC Optional control panel and automatic refill system for increased ease Electropolished and ultra-clean gas-wetted surfaces