ASCENT® AP (ADVANCED PULSING)
POWER SUPPLIES
Photo of Ascent(R) AP DC power supply
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering

In 2013, AE® disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-DC technology, providing unprecedented plasma control where only limited control previously existed.
Ascent AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented
pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation.
 
Benefits Features
  • Precise sputtering of dielectric and conductive films
  • Single-magnetron and dual-magnetron configurations available
  • Extended process control, flexibility, and innovation
  • High film quality and throughput
  • Repeatable, customizable films
  • Higher power levels with reduced arc damage
  • Easy integration and control
  • Advanced waveform customization for expanded access to power delivery
    parameters
  • Patented pulsing technology for remarkable arc prevention, higher power levels, and
    increased throughput
  • Compact, single-unit solution (up to 30 kW)
  • Set point compensation™ technology for stable throughput
  • Wide operational range to enable a variety of process materials